首页> 外国专利> Fe-Ni ALLOY FOR PRESS F0RMING TYPE FLAT MASK AND FLAT MASK USING THE SAME AND COLOR CATHODE-RAY TUBE

Fe-Ni ALLOY FOR PRESS F0RMING TYPE FLAT MASK AND FLAT MASK USING THE SAME AND COLOR CATHODE-RAY TUBE

机译:Fe-Ni合金,用于压铸型扁平面膜和采用相同和彩色阴极射线管的扁平面膜

摘要

PURPOSE: Provided is a Fe-Ni based alloy for a press forming die perfect flat mask improved in strength(falling impact deformation resistance) and having low thermal expansibility. CONSTITUTION: The present Fe-Ni based alloy for a press forming die perfect flat mask maintaining low thermal expansibility, and whose proof stress and Young's modulus are improved as well contains Ni 33-37 wt.%, Mn 0.001-0.1 wt.%, voluntarily Co less than 0.01-2 wt.% and further contains one or more kinds selected from Nb 0.01-0.8 wt.%, Ta 0.01-0.8 wt.% and Hf 0.01-0.8 wt.% by 0.01 to 0.8% in total, and the balance Fe with inevitable impurities, in which, preferably, as the impurities, the Fe-Ni based alloy contains C less than 0.01 wt.%, Si less than 0.04 wt.%, P less than 0.01 wt.%, S less than 0.01 wt.% and N less than 0.005 wt.%. The flat mask and color cathode-ray tube use the same.
机译:目的:提供一种用于压制成型模具的完美平面掩膜的铁-镍基合金,该掩膜的强度(抗冲击变形性下降)提高并且热膨胀性低。组成:用于压模模具的理想的Fe-Ni基合金完美的平面掩模,保持低的热膨胀性,并且其屈服应力和杨氏模量得到改善,还包含Ni 33-37 wt。%,Mn 0.001-0.1 wt。%,自愿地使Co含量小于0.01-2 wt。%,并且还包含选自Nb 0.01-0.8 wt。%,Ta 0.01-0.8 wt。%和Hf 0.01-0.8 wt。%中的一种或多种,​​共计0.01-0.8%,并且余量的Fe具有不可避免的杂质,其中,作为优选的Fe-Ni基合金,含有小于0.01重量%的C,小于0.04重量%的Si,小于0.01重量%的P,小于S的杂质作为杂质。小于0.01wt。%和N小于0.005wt。%。平面罩和彩色阴极射线管使用相同的掩模。

著录项

  • 公开/公告号KR100438989B1

    专利类型

  • 公开/公告日2004-07-03

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20010029917

  • 发明设计人 에토오마사토시;모리마사즈미;

    申请日2001-05-30

  • 分类号C22C38/08;

  • 国家 KR

  • 入库时间 2022-08-21 22:46:57

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