Method and apparatus for continuously forming a functional deposited film with a large area by the microwave plasma CVD method

摘要

PURPOSE: To generate microwave plasma almost uniformly over large area and volume, by protruding a microwave applicator into a film forming chamber, in the state that the applicator is included in a microwave transmitting member, and does not come into contact with the inner peripheral wall of the member. ;CONSTITUTION: A microwave applicator 108 is isolated from a microwave plasma region 113 by a plasma control means 120 and an isolation means 109. The microwave plasma region 113 is confined in a film forming chamber whose side wall is constituted of the bent part of a belt type member 101. A bias voltage generated by a power supply 118 for applying a bias voltage is applied to a bias voltage applying pipe 112 serving as a gas introducing pipe, via a lead wire 119. The bias voltage applying pipe 112 serving as the gas introducing pipe is insulated and isolated from a gas feeding pipe 17 via an insulative joint 116.;COPYRIGHT: (C)1994,JPO&Japio