DEVICE FOR GENERATING PLASMA, DEVICE FOR DEPOSITING DENSE AND HARD THIN FILM USING THE SAME AND METHOD FOR DEPOSITING HARD THIN FILM

摘要

PROBLEM TO BE SOLVED: To provide a method of depositing a film, by which a dense and hard film similar to a BN film, capable of preventing lowering of the absorption efficiency of RF electric power and containing a large amount of SP 3 structure, and to provide a device for depositing the film.;SOLUTION: A plasma generating chamber is provided adjacently to a film depositing chamber which can be made into a high vacuum state and in which a substrate is arranged. In the plasma generating chamber, a high frequency antenna for generating plasma and a target formed from a material capable of constituting the dense and hard thin film are each arranged so that the generation of high density plasma is realized and atoms of the target material sputtered from the target can be introduced onto the substrate in the ionized state.;COPYRIGHT: (C)2002,JPO