SUBSTRATE INSPECTOR, SUBSTRATE INSPECTING METHOD AND LIQUID TREATMENT APPARATUS PROVIDED WITH THE SUBSTRATE INSPECTOR

摘要

PROBLEM TO BE SOLVED: To provide a substrate inspector and a substrate inspecting method in which the number of substrates accommodated in a container as well as an accommodation state can be inspected simply and accurately for a short time; and to provide a liquid treatment apparatus provided with such the substrate inspector.;SOLUTION: A wafer inspection structure 110 inspects a state of accommodating a wafer W which is accommodated actually in a hoop F such that the wafers W can be accommodated in substantial parallel to each other at specific intervals, for example. The wafer inspection structure 110 has a reflection type sensor 111, a lifting structure 112 for moving the reflection type sensor 111 in an array direction of the wafer W, and a sensor amplifier 115 for obtaining an on/off signal by slicing a measured reflection intensity signal at least at two intensity levels. The resultant on/off signal is analyzed in a sequencer 114 to determine the state of accommodating the wafer W.;COPYRIGHT: (C)2002,JPO