首页> 外国专利> MANUFACTURING METHOD FOR SUBSTRATE FOR LITHOGRAPHIC PRINTING PLATE, SUBSTRATE FOR THE SAME AND PS PLATE

MANUFACTURING METHOD FOR SUBSTRATE FOR LITHOGRAPHIC PRINTING PLATE, SUBSTRATE FOR THE SAME AND PS PLATE

机译:平版印刷版基板的制造方法,同一版的基板和ps板的制造方法

摘要

PROBLEM TO BE SOLVED: To provide the manufacturing method for a substrate for lithographic printing plate, which obtains a PS plate without generating faulty appearance in the surface of a printing paper, and the PS plate not generating the faulty appearance in the surface of a printing paper.;SOLUTION: The substrate for lithographic printing plate is manufactured by a method wherein mechanical surface roughening treatment, which rubs by a rotary brush while supplying the grains of grinding material having an average grain size of 5-70 μm, the content of grains having the grain size of 100 μm or more is 10 wt.%, or less the content of grains having the grain size of 500 μm or less is 1 wt.% or less and the content of SiO2 grain is 90 wt.% or more, is applied on at least one side of the substrate. A light sensitive layer is formed on the substrate, obtained by the manufacturing method, to obtain the PS plate.;COPYRIGHT: (C)2001,JPO
机译:解决的问题:提供一种用于平版印刷版的基板的制造方法,该方法获得了PS板而不会在打印纸的表面上产生不良外观,并且PS板在印刷品的表面上没有产生不良外观。解决方案:用于平版印刷版的基材是通过以下方法制造的:机械表面粗糙化处理,在提供平均粒度为5-70μm的研磨材料的颗粒的同时,通过旋转刷进行摩擦,晶粒尺寸为100μm以上的晶粒的10%为10wt。%以下,晶粒尺寸为500μm以下的晶粒的含量为1wt。%以下,SiO 2晶粒的含量为1wt。%以下。在基材的至少一侧上施加90重量%或更多。在通过该制造方法获得的基板上形成光敏层,以获得PS板。;版权所有:(C)2001,JPO

著录项

  • 公开/公告号JP2001347770A

    专利类型

  • 公开/公告日2001-12-18

    原文格式PDF

  • 申请/专利权人 FUJI PHOTO FILM CO LTD;

    申请/专利号JP20000173771

  • 发明设计人 UESUGI AKIO;MIWA HIDEKI;MATSUURA MUTSUMI;

    申请日2000-06-09

  • 分类号B41N3/04;B41N3/03;C25D11/16;G03F7/00;G03F7/09;

  • 国家 JP

  • 入库时间 2022-08-22 00:55:44

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