首页> 外国专利> REGENERATING METHOD OF SILICON CARBIDE-COATED GRAPHITE ELEMENT AND SILICON CARBIDE-COATED GRAPHITE ELEMENT BY THE METHOD

REGENERATING METHOD OF SILICON CARBIDE-COATED GRAPHITE ELEMENT AND SILICON CARBIDE-COATED GRAPHITE ELEMENT BY THE METHOD

机译:碳化硅包覆石墨元素的再生方法及碳化硅包覆石墨元素的方法

摘要

PROBLEM TO BE SOLVED: To provide a regenerating method of a SiC coated-graphite element, and a SiC coated-graphite element which is regenerated by the method. The SiC-coated graphite element which has become its life end consisting of a SiC- coated graphite element, and used as an element for pulling up monocrystal, and as a suscepter for the epitaxial growth of a silicon wafer in a semiconductor manufacturing process which can homogeneously remove surface-coated SiC, can use a small type exhaust gas treating device and can reduce the semiconductor manufacturing cost.;SOLUTION: The SiC-coated graphite element is reused after coating SiC with CVD method on the base material which is evaporated the surface coated SiC at a temperature not less than 1700°C, under pressure not higher than 1.33 kPa, in an innert gas atmosphere or under pressure not higher than 1.33 kPa in an innert gas atmosphere.;COPYRIGHT: (C)2002,JPO
机译:解决的问题:提供一种SiC涂层的石墨元素的再生方法,以及通过该方法再生的SiC涂层的石墨元素。使用寿命已长的由SiC涂层的石墨元素组成的SiC涂层的石墨元素,用作提拉单晶的元素,并用作半导体制造过程中硅晶片外延生长的基座。均匀地去除表面涂层的SiC,可以使用小型废气处理装置,并降低半导体制造成本。;解决方案:将CVD涂层的SiC涂覆在蒸发了表面的基材上后,可以重新使用SiC涂覆的石墨元件。在惰性气体气氛中,温度不低于1700摄氏度,压力不高于1.33 kPa或在惰性气体气氛中,不高于1.33 kPa的条件下涂覆SiC.COPYRIGHT:(C)2002,JPO

著录项

  • 公开/公告号JP2002037684A

    专利类型

  • 公开/公告日2002-02-06

    原文格式PDF

  • 申请/专利权人 TOYO TANSO KK;

    申请/专利号JP20000225674

  • 发明设计人 KONDO TERUHISA;HIRANO HIROYUKI;

    申请日2000-07-26

  • 分类号C04B41/87;C04B41/91;H01L21/205;

  • 国家 JP

  • 入库时间 2022-08-22 00:55:34

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