首页> 外国专利> METHOD OF MANUFACTURING MICRO OPTICAL ELEMENT, MICRO OPTICAL ELEMENT MANUFACTURED BY THE METHOD, AND OPTICAL DEVICE USING THE ELEMENT

METHOD OF MANUFACTURING MICRO OPTICAL ELEMENT, MICRO OPTICAL ELEMENT MANUFACTURED BY THE METHOD, AND OPTICAL DEVICE USING THE ELEMENT

机译:制造微光学元件的方法,由该方法制造的微光学元件以及使用该元件的光学器件

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing micro optical element by which high-accuracy micro-working can be performed on a micro optical element by suppressing the occurrence of the drift of an ion beam caused by an abrupt change in electrostatic charge in the course of working (FIB working) which is performed by using a converged ion beam, and to provide a micro optical element manufactured by the method and an optical device using the optical element.;SOLUTION: The method of manufacturing micro optical element in which openings smaller than the wavelength of light are formed includes a step of preparing an object to be worked having at least a conductive light shielding film and an insulating light transmitting substrate and a step of forming the openings smaller than the wavelength of light at desired positions by etching the conductive light shielding film partway in the thickness direction of the film by projecting a converged ion beam upon the object to be worked.;COPYRIGHT: (C)2003,JPO
机译:解决的问题:提供一种制造微光学元件的方法,通过该方法,可以通过抑制由静电电荷的突然变化引起的离子束漂移的发生,来对微光学元件进行高精度的微加工。通过使用会聚离子束进行的工作过程(FIB工作),以提供通过该方法制造的微光学元件和使用该光学元件的光学器件。;解决方案:一种制造微光学元件的方法,其中形成小于光的波长的开口的步骤包括:准备至少具有导电性遮光膜和绝缘性透光性基板的被加工物的步骤;以及通过在所希望的位置形成比光的波长小的开口的步骤。通过将会聚的离子束投射到待加工物体上,在膜的厚度方向上部分蚀刻导电光屏蔽膜。;版权:(C)2003,日本特许厅

著录项

  • 公开/公告号JP2002323428A

    专利类型

  • 公开/公告日2002-11-08

    原文格式PDF

  • 申请/专利权人 CANON INC;

    申请/专利号JP20010129212

  • 发明设计人 KURODA AKIRA;AEBA TOSHIAKI;

    申请日2001-04-26

  • 分类号G01N13/14;G02B5/00;G02B21/06;G11B7/135;G12B21/06;

  • 国家 JP

  • 入库时间 2022-08-22 00:54:50

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