首页> 外国专利> CERIUM-BASED ABRASIVE PARTICLE POWDER HAVING EXCELLENT PARTICLE SIZE DISTRIBUTION, SLURRY OF ABRASIVE CONTAINING THE PARTICLE POWDER AND METHOD FOR PRODUCING THE PARTICLE POWDER

CERIUM-BASED ABRASIVE PARTICLE POWDER HAVING EXCELLENT PARTICLE SIZE DISTRIBUTION, SLURRY OF ABRASIVE CONTAINING THE PARTICLE POWDER AND METHOD FOR PRODUCING THE PARTICLE POWDER

机译:具有优异粒径分布的铈基磨料颗粒粉,磨料中含有磨料颗粒的粉尘及其生产方法

摘要

PROBLEM TO BE SOLVED: To obtain an abrasive particle powder maintaining a sufficient polishing rate and having an excellent polished surface and improving washing properties of the abrasive particle powder remaining after polishing in polishing using a cerium-based abrasive particle powder.;SOLUTION: This abrasive particle powder comprises a cerium-based abrasive particle powder containing a cerium oxide in an amount of 30-80 wt.% based on rare earth oxides and satisfies the following formulae (1) and (2) when 10%, 50% and 90% particle diameters (μm) from the small particle diameter side are d10, d50 and d90 respectively in cumulative particle size distribution of particle size distribution measurement of the particle powder. 0.1≤d50≤3 (1) d90/d10≤15 (2).;COPYRIGHT: (C)2002,JPO
机译:解决的问题:为了获得保持足够的抛光速率并具有优异的抛光表面并改善使用铈基磨料粉末进行抛光后残留的磨料粉末的洗涤性能的磨料粉末。颗粒粉末包括基于铈的磨料颗粒粉末,其基于稀土氧化物的含量为30-80 wt。%的氧化铈,并且在10%,50%和90%时满足下式(1)和(2)在颗粒粉末的粒径分布测量中,从小粒径侧开始的粒径(μm)分别为d10,d50和d90。 0.1&d; d50≤ 3(1)d90 / d10≤ 15(2).;版权:(C)2002,JPO

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