首页>
外国专利>
CERIUM-BASED ABRASIVE PARTICLE POWDER HAVING EXCELLENT PARTICLE SIZE DISTRIBUTION, SLURRY OF ABRASIVE CONTAINING THE PARTICLE POWDER AND METHOD FOR PRODUCING THE PARTICLE POWDER
CERIUM-BASED ABRASIVE PARTICLE POWDER HAVING EXCELLENT PARTICLE SIZE DISTRIBUTION, SLURRY OF ABRASIVE CONTAINING THE PARTICLE POWDER AND METHOD FOR PRODUCING THE PARTICLE POWDER
展开▼
机译:具有优异粒径分布的铈基磨料颗粒粉,磨料中含有磨料颗粒的粉尘及其生产方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
PROBLEM TO BE SOLVED: To obtain an abrasive particle powder maintaining a sufficient polishing rate and having an excellent polished surface and improving washing properties of the abrasive particle powder remaining after polishing in polishing using a cerium-based abrasive particle powder.;SOLUTION: This abrasive particle powder comprises a cerium-based abrasive particle powder containing a cerium oxide in an amount of 30-80 wt.% based on rare earth oxides and satisfies the following formulae (1) and (2) when 10%, 50% and 90% particle diameters (μm) from the small particle diameter side are d10, d50 and d90 respectively in cumulative particle size distribution of particle size distribution measurement of the particle powder. 0.1≤d50≤3 (1) d90/d10≤15 (2).;COPYRIGHT: (C)2002,JPO
展开▼