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APERTURE MANUFACTURING EQUIPMENT AND METHOD OF SURFACE EMITTING LASER (VCSEL) BY SELECTIVE OXIDATION METHOD

机译:选择性氧化法制造孔发射激光器的设备和方法

摘要

PROBLEM TO BE SOLVED: To provide an aperture manufacturing equipment and a method of a surface emitting laser by selective oxidation method wherein change of a resonance wavelength is observed by using an optical spectrum analyzer and an aperture manufacturing process can be monitored.;SOLUTION: This aperture manufacturing equipment is provided with a stage 21 on which a wafer 10 for the surface emitting laser having a preliminary oxide layer is mounted, a light source 31, and an optical spectrum analyzer 41 which is installed outside a furnace and receives a light reflected from the wafer, and can determine an aperture diameter from optical intensity change of a resonance peak wavelength which is caused by diameter change of the aperture formed in the preliminary oxide layer.;COPYRIGHT: (C)2001,JPO
机译:解决的问题:提供一种通过选择性氧化方法制造的光阑制造设备和表面发射激光器的方法,其中通过使用光谱分析仪观察共振波长的变化,并且可以监测光阑制造过程。光圈制造设备具有:载物台21,其上安装有具有初步氧化物层的表面发射激光器的晶片10;光源31;和光谱分析仪41,其安装在炉子外部并接收从反射镜反射的光。晶片,并可以根据共振峰波长的光强度变化来确定孔径,该谐振峰波长是由形成在预氧化层中的孔径的直径变化引起的。版权所有:(C)2001,JPO

著录项

  • 公开/公告号JP2001332813A

    专利类型

  • 公开/公告日2001-11-30

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO LTD;

    申请/专利号JP20000377774

  • 发明设计人 MINAMI NORIHIRO;SO EISHIN;

    申请日2000-12-12

  • 分类号H01S5/183;

  • 国家 JP

  • 入库时间 2022-08-22 00:53:32

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