首页> 外国专利> Self aligned method of forming a semiconductor memory array of floating gate memory cells with low resistance source regions and high source coupling, and a memory array made thereby

Self aligned method of forming a semiconductor memory array of floating gate memory cells with low resistance source regions and high source coupling, and a memory array made thereby

机译:自对准形成具有低电阻源区和高源耦合的浮栅存储单元的半导体存储阵列的方法,以及由此制成的存储阵列

摘要

A self aligned method of forming a semiconductor memory array of floating gate memory cells in a semiconductor substrate having a plurality of spaced apart isolation regions and active regions on the substrate substantially parallel to one another in the column direction, and an apparatus formed thereby. Floating gates are formed in each of the active regions. In the row direction, trenches are formed that include indentations or different widths. The trenches are filled with a conducting material to form blocks of the conducting material that constitute source regions with a first portion that is disposed adjacent to but insulated from the floating gate, and a second portion that this disposed over but insulated from the floating gate.
机译:一种自对准方法,其在半导体衬底中形成浮栅存储单元的半导体存储器阵列,该半导体衬底在衬底上具有多个在列方向上基本彼此平行的间隔开的隔离区和有源区,并由此形成了一种装置。在每个有源区中形成浮栅。在行方向上,形成包括凹陷或不同宽度的沟槽。沟槽填充有导电材料以形成导电材料块,所述导电材料块构成源极区,其第一部分设置成与浮动栅极相邻但与浮动栅极绝缘,并且第二部分设置成与浮动栅极相邻但与浮动栅极绝缘。

著录项

  • 公开/公告号US2002034849A1

    专利类型

  • 公开/公告日2002-03-21

    原文格式PDF

  • 申请/专利权人 WANG CHIH HSIN;LEVI AMITAY;

    申请/专利号US20010916555

  • 发明设计人 AMITAY LEVI;CHIH HSIN WANG;

    申请日2001-07-26

  • 分类号H01L21/336;H01L29/76;

  • 国家 US

  • 入库时间 2022-08-22 00:52:07

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