Developer nozzle for supplying developer to a surface of a semiconductor process wafer

摘要

The developer nozzle is employed to supply developer, in a photographic technique of a photoresist and etching process, for developing photoresist to a surface of a semiconductor process wafer at least partly covered with the photoresist. The face of the developer nozzle that comes to face the surface of the semiconductor wafer and that closes off the developer supply duct in the developer nozzle is flat.