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Oxide/organic polymer multilayer thin films deposited by chemical vapor deposition
Oxide/organic polymer multilayer thin films deposited by chemical vapor deposition
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机译:通过化学气相沉积法沉积的氧化物/有机聚合物多层薄膜
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摘要
Multilayer thin films consisting of alternating layers of oxide and organic polymer dielectric materials are manufactured by chemical vapor deposition using a CVD apparatus comprising separate precursor volatilization/dissociation areas. Methods are described for the manufacture of multilayered films. The electrical properties of the multilayered films make the films of embodiments of this invention suitable for use as dielectric materials for semiconductor manufacture. The multilayered films of embodiments this invention reduce RC delay and cross-talk, thereby permitting increased density, higher frequency performance and greater reliability of semiconductor devices for use in the electronics industry.
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