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Etching solution for wet chemical pyramidal texture etching of silicon surfaces
Etching solution for wet chemical pyramidal texture etching of silicon surfaces
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机译:硅表面湿化学金字塔纹理蚀刻的蚀刻溶液
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摘要
A new and improved etching solution and etching method provide wet chemical pyramidal texture etching of (100) silicon surfaces. A uniform and completely pyramidal texture etching of silicon surfaces is achieved with an etching solution including water, an alkaline reagent, and isopropanol together with an aqueous alkaline ethylene glycol solution.
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