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Process of forming field emission electrode for manufacturing field emission array

机译:用于制造场致发射阵列的场致发射电极的形成方法

摘要

A process of forming a field emission electrode for manufacturing a field emission array is provided. The process includes steps of (a) providing a substrate having a metal layer thereon, (b) forming a plurality of mask units on the metal layer and partially removing the metal layer uncovered by the mask units, (c) oxidizing a surface of the remained metal layer by an anodic oxidization method for forming a metal oxide layer thereon such that an upper portion of the unoxidized remained metal layer is in the shape of plural conoids, and (d) removing the remained mask units and the metal oxide layer. Alternatively, the process includes steps of (a) providing a substrate having a first metal layer thereon, (b) forming a plurality of mask units on the first metal layer and partially removing the first metal layer uncovered by the mask units, (c) oxidizing a surface of the remained first metal layer by an anodic oxidization method for forming a metal oxide layer thereon such that an upper portion of the unoxidized remained first metal layer is in the shape of plural cylinders, (d) forming a second metal layer on the metal oxide layer, and (e) removing the remained mask units.
机译:提供了一种形成用于制造场发射阵列的场发射电极的工艺。该方法包括以下步骤:(a)提供其上具有金属层的基板;(b)在金属层上形成多个掩模单元;以及部分去除未被掩模单元覆盖的金属层;(c)氧化衬底的表面。通过阳极氧化法在金属上形成残留金属层,以在其上形成金属氧化物层,使得未氧化的残留金属层的上部呈多个圆锥体的形状,并且(d)去除残留的掩模单元和金属氧化物层。可选地,该工艺包括以下步骤:(a)提供其上具有第一金属层的基板;(b)在第一金属层上形成多个掩模单元;以及部分地去除未被掩模单元覆盖的第一金属层;(c)通过阳极氧化方法对剩余的第一金属层的表面进行氧化,以在其上形成金属氧化物层,使得未氧化的剩余的第一金属层的上部呈多个圆柱体的形状,(d)在其上形成第二金属层。金属氧化物层,和(e)去除剩余的掩模单元。

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