Exposure apparatus and control method for correcting an exposure optical system on the basis of an estimated magnification variation

摘要

In an exposure apparatus for projecting illumination light irradiating a reticle on a wafer via an optical system, a mark magnification variation &Dgr;&bgr;_M is calculated from the displacement amounts of a plurality of position measurement marks used for reticle alignment. From the mark magnification variation &Dgr;&bgr;_M, a shot magnification &Dgr;&bgr;_S is estimated using an estimation equation having an aspect ratio A and area ratio S of the exposure region as parameters:; $PTEXTPDAT\&Dgr;\&bgr;/PDATHILSBPDATS/PDAT/SB/HILHILITALICPDAT\=c\·A/PDAT/ITALIC/HILHILSPPDATp/PDAT/SP/HILHILITALICPDAT\·S/PDAT/ITALIC/HILHILSPPDATq/PDAT/SP/HILPDAT\·\&Dgr;\&bgr;/PDATHILSBPDATM/PDAT/SB/HIL/PTEXT$ ;(where c, p, q are coefficients). The shot magnification is corrected based on the estimation result using the magnification correction function of a projection lens.