embedded image;x, y and z each denote an integer of 1 or more, X is a residue of an organic compound having 2 active hydrogen groups, Y is a hydrocarbon group having 1 or more carbon atoms, and R1 is a dicarboxylic acid compound residue, or a diisocyanate compound residue. On the plate making film, an image is formed, preferably, by ink jets using, preferably, a plate making ink containing a mono- or disazo dye which is a yellow dye highly ultraviolet absorbing properties for a wavelength of 350 to 450 nm. An inexpensive, high resolution, high grade photomask for plate making is produced thereby."/> Plate making film, plate making ink, plate making method using the film, and plate making system using the film
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Plate making film, plate making ink, plate making method using the film, and plate making system using the film

机译:制版膜,制版油墨,使用该膜的制版方法以及使用该膜的制版系统

摘要

A plate making film has a layer provided on a transparent substrate, the layer consisting essentially of a polymeric compound composed of a repeating unit represented by the following general formula (1):; PTEXTPDAT&Brketopenst;AXAR/PDATHILSBPDAT1/PDAT/SB/HILPDAT&Brketclosest;  (1)/PDAT/PTEXT ;where A is embedded image;x, y and z each denote an integer of 1 or more, X is a residue of an organic compound having 2 active hydrogen groups, Y is a hydrocarbon group having 1 or more carbon atoms, and R1 is a dicarboxylic acid compound residue, or a diisocyanate compound residue. On the plate making film, an image is formed, preferably, by ink jets using, preferably, a plate making ink containing a mono- or disazo dye which is a yellow dye highly ultraviolet absorbing properties for a wavelength of 350 to 450 nm. An inexpensive, high resolution, high grade photomask for plate making is produced thereby.
机译:制版膜具有在透明基板上设置的层,该层主要由高分子化合物组成,该高分子化合物由以下通式(1)表示的重复单元构成: <数学> <![CDATA [ &Brketopenst; AXAR 1 &Brketclosest; (1) ]]> ;其中A是 “嵌入式图像” ; x,y和z分别表示1或更大的整数,X是具有2个活泼氢基团,Y为具有1个以上碳原子的烃基,R Sub1为二羧酸化合物残基或二异氰酸酯化合物残基。在制版膜上,优选地通过喷墨法使用优选地包含含有单或双偶氮染料的制版油墨来形成图像,该单或二偶氮染料是黄色染料,其在350至450nm的波长下具有高紫外线吸收特性。由此制得了用于制版的廉价,高分辨率,高质量的光掩模。

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