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Non-charging critical dimension SEM metrology standard
Non-charging critical dimension SEM metrology standard
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机译:非充电临界尺寸SEM计量标准
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摘要
An SEM measurement standard for measuring linewidths of 0.1 microns and below utilizes two different conducting materials in order to prevent charging effects. The top material is selected to use grain morphology to focus secondary electrons, and to obtain improved image contrast. The inventive standard is comprised of materials which are commonly used in semiconductor manufacturing and which do not cause contamination of fabrication facilities.
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