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Method for producing a high-speed power diode with soft recovery, and a power diode produced using such a method

机译:具有软恢复的高速功率二极管的制造方法以及使用该方法制造的功率二极管

摘要

In a method for producing a high-speed power diode with soft recovery, in which method the carrier life within the associated semiconductor substrate (10) is governed by first, unmasked bombardment (14) with an axial profile and by subsequent, second, masked bombardment (15) with a lateral profile, improved reverse characteristics are achieved in that the first, unmasked bombardment is ion bombardment (14) which governs the switching response of the power diode and in that the second, masked bombardment is electron bombardment (15), which reduces the active area of the power diode. In a power diode equipped with such a semiconductor substrate (10), the thermal resistance Rth is reduced in relation to the active area of the power diode.
机译:在具有软恢复的高速功率二极管的制造方法中,在该方法中,关联的半导体衬底( 10 )中的载流子寿命由首先进行的未掩盖轰击( 14 )具有轴向轮廓,随后进行第二次带有侧面轮廓的掩膜轰击( 15 ),则改善了反向特性,因为第一个未掩盖轰炸是离子轰击( 14 )控制功率二极管的开关响应,第二个掩盖轰击是电子轰击( 15 ),这会减小功率二极管的有效面积。在配备有这样的半导体衬底( 10 )的功率二极管中,相对于功率二极管的有源区域,热阻R th 减小。

著录项

  • 公开/公告号US6469368B2

    专利类型

  • 公开/公告日2002-10-22

    原文格式PDF

  • 申请/专利权人 ABB SCHWEIZ AG;

    申请/专利号US20010897027

  • 发明设计人 NORBERT GALSTER;

    申请日2001-07-03

  • 分类号H01L291/67;H01L292/07;H01L292/27;

  • 国家 US

  • 入库时间 2022-08-22 00:48:42

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