首页> 外国专利> Stage system for exposure apparatus and device manufacturing method in which a stage supporting member and a countermass supporting member provide vibration isolation

Stage system for exposure apparatus and device manufacturing method in which a stage supporting member and a countermass supporting member provide vibration isolation

机译:用于曝光设备的台架系统和设备制造方法,其中台架支撑构件和反质量支撑构件提供振动隔离

摘要

A stage system includes a stage mechanism having a movable stage and a stage supporting member for carrying the movable stage thereon, and a countermass mechanism having a movable countermass and a countermass supporting member for carrying the countermass thereon, wherein the stage supporting member and the countermass supporting member are supported separately or with vibration isolated.
机译:台架系统包括:台架机构,其具有可动台架;以及台架支撑构件,其用于在其上承载可动台架;以及平衡块机构,其具有可动台架和台架支撑构件,其用于在其上承载台架。支撑部件单独支撑或隔离振动。

著录项

  • 公开/公告号US6396566B2

    专利类型

  • 公开/公告日2002-05-28

    原文格式PDF

  • 申请/专利权人 CANON KABUSHIKI KAISHA;

    申请/专利号US19980219601

  • 发明设计人 RYUICHI EBINUMA;MAKOTO MIZUNO;

    申请日1998-12-23

  • 分类号G03B274/20;G03B275/80;G03B276/20;

  • 国家 US

  • 入库时间 2022-08-22 00:47:53

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