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Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations
Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations
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机译:缩醛衍生的羟基芳族聚合物的生产及其在辐射敏感配方中的用途
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摘要
The present invention provides a process for generating mixed acetal polymers by reacting a hydroxyl containing polymer or monomer with vinyl ether and alcohol in the presence of an acid catalyst. The process of this invention provides a new class of polymers based on mixed acetals which are prepared in-situ with one reaction. The mixed acetal polymers are inexpensive to synthesize and readily reproducible. The resulting mixed acetal polymer is blended with a photoacid generator and dissolved in a solvent to produce a chemically amplified resist composition. A process for forming a pattern comprises the steps of providing the chemically amplified resist composition, coating a substrate with the resist composition, imagewise exposing the resist coated substrate to actinic radiation, and forming a resist image by developing the resist coated substrate.
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