Mask inspecting apparatus and mask inspecting method which can inspect mask by using electron beam exposure system without independently mounting another mask inspecting apparatus

摘要

A mask inspecting method includes (a), (b), (c), and (d). The (a) includes providing an electron beam exposure system used for patterning a wafer with a mask. The (b) includes emitting electrons to the mask from the electron beam exposure system. The (c) includes detecting an electron passing through the mask of the emitted electrons. The (d) includes inspecting the mask for a defect based on a detected result of the (c).