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Process control with control signal derived from metrology of a repetitive critical dimension feature of a test structure on the work piece

机译:利用从工件上测试结构的重复临界尺寸特征的度量得出的控制信号进行过程控制

摘要

A method is provided for manufacturing, the method including processing a workpiece in a processing step, measuring a critical dimension of features formed on the workpiece using a test structure formed on the workpiece, the test structure including a plurality of the features, and forming an output signal corresponding to the critical dimension measurements. The method also includes feeding back a control signal based on the output signal to adjust the processing performed in the processing step if the output signal corresponding to the critical dimension measurements indicates a predetermined tolerance value has been exceeded.
机译:提供了一种用于制造的方法,该方法包括在加工步骤中加工工件,使用在工件上形成的测试结构来测量在工件上形成的特征的临界尺寸,该测试结构包括多个特征,并且形成对应于临界尺寸测量的输出信号。该方法还包括:如果对应于临界尺寸测量的输出信号指示已经超过预定的公差值,则基于输出信号反馈控制信号以调整在处理步骤中执行的处理。

著录项

  • 公开/公告号US6368879B1

    专利类型

  • 公开/公告日2002-04-09

    原文格式PDF

  • 申请/专利权人 ADVANCED MICRO DEVICES INC.;

    申请/专利号US19990401090

  • 发明设计人 ANTHONY J. TOPRAC;

    申请日1999-09-22

  • 分类号H01L210/00;

  • 国家 US

  • 入库时间 2022-08-22 00:46:57

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