PROCESS FOR PRODUCING A GRATING STRUCTURE, OPTICAL ELEMENT, EVANESCENT FIELD SENSOR PLATE, A MICROTITRE PLATE AND OPTICAL COUPLER FOR COMMUNICATIONS TECHNOLOGY AS WELL AS DEVICE FOR MONITORING A WAVELENGTH

摘要

ABSTRACTFor producing a coupling grating formed as a line grating with a grating period between 100 nm and 2500 nm, asubstrate (1) is covered with a photoresist layer (10) andexposed for instance at the Lithrow angle ([err]L) or at 0[err] to amercury-vapour lamp (11) via a folding mirror (13, 13’) through a phase mask (14) in the near field of which thephotoresist layer is arranged, then structured by reactive ion etching and provided with a transparent layer by reac-tive DC magnetron sputtering, particularly puled DC sput -tering or AC-superimposed DC sputtering. The phase mask (14) is structured in advance with the laser two-beam interfer ence method. Since highly precise gratings can be producedeven in large dimensions, the process is particularly suited for the production of optical elements, particularly evane-scent field sensor plates and optical couplers for communi- cations technology which can be employed in particular as filters for wavelength multiplexing in fibre-optic networks.Fig. 5