BAKING OVEN FOR THE HIGH-TEMPERATURE TREATMENT OF MATERIALS WITH A LOW DIELECTRIC LOSS FACTOR

摘要

In a baking oven (10) for the high-temperature treatment of materials with arelatively low dielectric loss factor (tan .delta.) by heating the material byabsorption of microwave energy in a resonant chamber (16), a uniform energyintensity of the microwave field is to be achieved for example by irradiatingthe microwave energy over a broad band and/or by varying in time the frequencyof the irradiated microwave energy. The resonant chamber (16) and theradiation source (13) are tuned to each other such that the relation:(V/.lambda.3) .B 20 is satisfied. V stands for the volume of the resonantchamber (16), .lambda. for the wavelength of the microwave radiation and B itsband width. V/.lambda.3 equals at least 300 and the clear dimensions lx, lyand lz of the resonant cavity (16) in the direction of the co-ordinates x, yand z are approximately equal to the cubic root of V. The wall (161 to 166) ofthe resonant cavity is made of graphite and can be heated by a heating device(28) up to the temperature of the material to be treated. The heating deviceis arranged outside the resonant chamber, and a heat insulating envelope (38)encloses the unit of resonant cavity (16) and heating device.