Apparatus and method for treatment of substrates by means of a barrier discharge device producing plasma particles and/or UV-radiation

摘要

The use of a dielectrically hindered discharge device (4d) for surface treatment (esp. cleaning) in a vacuum chamber is new. Also claimed are: (i) a method of vacuum treating (esp. cleaning) surfaces using a dielectric layer-hindered discharge, prior to coating involving maintaining a dielectric layer-hindered discharge between two electrodes and causing the resulting particle and/or photon radiation to act on the surface (5a,b) to modify the surface structure (esp. in the near-surface boundary region) esp. so that surface impurities (esp. oily deposits) are removed; and (ii) an appts. for carrying out the method comprising a vacuum coating chamber contg. a barrier discharge device (4d) for emitting UV radiation and/or a plasma particle flux, esp. during the chamber pump-down phase, to effect photochemical and/or plasma-chemical induced cleaning of a surface (5a,b) facing the device within the chamber. Pref. the surfaces (5a,5b) to be coated are of metal, ceramic, glass or plastics, esp. thermosetting, thermoplastic or polyethylene plastics.