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PHOTO-ADDRESSABLE SUBSTRATES AND PHOTO-ADDRESSABLE SIDE-GROUP POLYMERS WITH HIGHLY INDUCIBLE DOUBLE REFRACTION

机译:具有高度不易发生的双折射的可光致基质和可光致粘合的侧基聚合物

摘要

Disclosed is an extremely rapidly photo-addressable storage media from inherently slow photo-addressable polymers by irradiating a substrate over a large area with a light source suitable for conventional inscription so that an optical anisotropy, i.e. a double refraction with a preferential direction in the plane of the substrate occurs. If the substrates so prepared are briefly intensively irradiated, the pattern is inscribed extremely rapidly and permanently. The invention also relates to novel side-chain polymers in which high optical anisotropy can be generated by irradiation. This optical anisotropy is very heat stable.
机译:公开了一种由固有慢的可光寻址聚合物制成的极其快速的可光寻址存储介质,该介质是通过用适合常规刻印的光源在大面积上照射基板来实现的,从而产生光学各向异性,即在平面中具有优先方向的双折射发生基材的表面腐蚀。如果短暂地强烈辐照如此制备的基材,则图案将被极其迅速且永久地刻划。本发明还涉及其中可以通过照射产生高光学各向异性的新型侧链聚合物。该光学各向异性非常热稳定。

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