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PHOTO-ADDRESSABLE SUBSTRATES AND PHOTO-ADDRESSABLE SIDE-GROUP POLYMERS WITH HIGHLY INDUCIBLE DOUBLE REFRACTION
PHOTO-ADDRESSABLE SUBSTRATES AND PHOTO-ADDRESSABLE SIDE-GROUP POLYMERS WITH HIGHLY INDUCIBLE DOUBLE REFRACTION
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机译:具有高度不易发生的双折射的可光致基质和可光致粘合的侧基聚合物
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摘要
Disclosed is an extremely rapidly photo-addressable storage media from inherently slow photo-addressable polymers by irradiating a substrate over a large area with a light source suitable for conventional inscription so that an optical anisotropy, i.e. a double refraction with a preferential direction in the plane of the substrate occurs. If the substrates so prepared are briefly intensively irradiated, the pattern is inscribed extremely rapidly and permanently. The invention also relates to novel side-chain polymers in which high optical anisotropy can be generated by irradiation. This optical anisotropy is very heat stable.
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