PHOTO-ADDRESSABLE SUBSTRATES AND PHOTO-ADDRESSABLE SIDE-GROUP POLYMERS WITH HIGHLY INDUCIBLE DOUBLE REFRACTION

摘要

It is possible to produce extremely rapidly photo-addressable storage mediafrom inherently slowly photo-addressable polymers byirradiating the substrates over a large area with a light source suitable forconventional inscription so that an optical anisotropy, i.e. a doublerefraction with a preferential direction in the plane of the substrate,occurs. If the substrates prepared in this way are briefly intensivelyirradiated, the pattern is inscribed extremely rapidly and permanently. Theinvention also relates to novel side-chain polymers in whichhigh optical anisotropy can be generated by irradiation. This opticalanisotropy is very heat stable.