APPARATUS FOR COOLING QUARTZ TUBE OF MODIFIED CHEMICAL VAPOR DEPOSITION(MCVD)

摘要

PURPOSE: Provided is an apparatus for cooling a quartz tube in forming a porous film of modified chemical vapor deposition(MCVD), which comprises a refrigerant tank, refrigerant-spraying nozzle and nozzle-supporting frame. Therefore, the cooling apparatus forms homogeneous deposition layers and controls used refrigerant effectively. CONSTITUTION: The apparatus comprises the parts of: a refrigerant tank(12) with an inlet in which at least one gas selected from N2, freon and mixture thereof is poured; a cylindrical nozzle-supporting frame(11) surrounding the outer circumference of a quartz tube(1); a refrigerant-spraying nozzle set on the inner circumference of the nozzle-supporting frame, where the refrigerant, being recycled to the refrigerant tank, is at least one selected from the group consisting of distilled water, deuterium oxide, light water, and mixture thereof; and a burner(2). The operating direction of burner and cooling apparatus is the opposite of the flow of gas in the quartz tube(1), and the cooling is precisely controlled by the control of the size and number of nozzle, and the pressure of spraying, which results in forming of homogeneous deposition layers.