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Synthesis Method of Mesoporous Silicas with Chelating Ligands for Heavy Metal Ion Removal in Aqueous Solutions

机译:螯合配体介孔二氧化硅在水溶液中去除重金属离子的合成方法

摘要

PURPOSE: A method of synthesizing mesoporous silica suitable to selective adsorption for heavy metal ion dissolved in wastewater, especially from plating industries. In this method, tetrealkoxysilanes such as tetramethoxysilane or tetraethoxysilane are used as structural precursor of the mesoporous silica. Dodecyl amine, a kind of neutral amine surfactant, is used to prevent destruction of hydroxyl radicals in silica walls during the calcining process. In addition, such reagents as 3-aminopropyl triethoxy silane and 3-mercaptopropyltrimethoxy silane are used to introduce amine and thiol group, which are reactive with heavy metal ions, on silica walls. CONSTITUTION: The mesoporous silica is synthesized by (i) after dissolving dodecyl amine into ethanol, mixing the mixture solution with tetraethoxy silane; (ii) addition of 3-aminopropyl triethoxy silane and 3-mercaptopropyltrimethoxy silane into the mixture solution at the point that the mixture solution become milky after the hydration and condensation of tetraethoxysilane, and then agitating severely for more than 20hrs; (iii) drying the obtained mesoporous silica at an ambient temperature for more than 24hrs, and then soxhlet extraction with ethanol for more than 72hrs to eliminate residual surfactants and organic silane; (iv) drying resultant mesoporous silica at an ambient temperature for more than 24hrs, and then heating at 100deg.C for 1hr.
机译:用途:一种合成介孔二氧化硅的方法,该方法适合选择性吸附废水中溶解的重金属离子,特别是来自电镀行业的重金属离子。在该方法中,将四烷氧基硅烷如四甲氧基硅烷或四乙氧基硅烷用作中孔二氧化硅的结构前体。十二胺是一种中性胺表面活性剂,用于防止煅烧过程中破坏二氧化硅壁中的羟基自由基。另外,诸如3-氨基丙基三乙氧基硅烷和3-巯基丙基三甲氧基硅烷的试剂用于在二氧化硅壁上引入与重金属离子反应的胺基和硫醇基。组成:介孔二氧化硅的合成方法是:(i)将十二烷基胺溶解在乙醇中,然后将混合溶液与四乙氧基硅烷混合; (ii)在混合溶液经四乙氧基硅烷水合和缩合后变成乳状,然后剧烈搅拌超过20小时,向混合物溶液中加入3-氨基丙基三乙氧基硅烷和3-巯基丙基三甲氧基硅烷。 (iii)将所得的中孔二氧化硅在环境温度下干燥超过24小时,然后用乙醇进行索氏提取超过72小时以除去残留的表面活性剂和有机硅烷; (iv)将所得的介孔二氧化硅在环境温度下干燥超过24小时,然后在100℃下加热1小时。

著录项

  • 公开/公告号KR20020007772A

    专利类型

  • 公开/公告日2002-01-29

    原文格式PDF

  • 申请/专利权人 LEE JONG HEOP;

    申请/专利号KR20000041216

  • 申请日2000-07-19

  • 分类号B01J20/10;

  • 国家 KR

  • 入库时间 2022-08-22 00:31:36

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