首页>
外国专利>
a thin film type electro luminescent display panel a manufacturing process equipment bymeans a thin film type electro luminescent display panel
a thin film type electro luminescent display panel a manufacturing process equipment bymeans a thin film type electro luminescent display panel
展开▼
机译:薄膜型电致发光显示面板制造工艺设备是指薄膜型电致发光显示面板
展开▼
页面导航
摘要
著录项
相似文献
摘要
PURPOSE: A method for fabricating a thin film type electro-luminescence display device and a thin film type electro-luminescence display device are provided to improve reliability of the electro-luminescence display device by performing all processes within one vacuum bath including an ion beam source. CONSTITUTION: A column electrode as an ITO(Indium Tin Oxide) transparent electrode(12) is formed on a glass or a ceramic substrate(11). A lower insulating layer is formed on the ITO transparent electrode(12) by depositing oxides of SiO2(13a) and Ta2O5(13b) on the ITO transparent electrode(12). A light emitting layer(14) is formed on the lower insulating layer. A plasma process is performed by implanting a mixed gas of oxygen and argon. An upper insulating layer including Ta2O5(15b) and SiO2(15a) is formed on the light emitting layer(14). A metal electrode(16) is formed on the upper insulating layer.
展开▼
机译:目的:提供一种用于制造薄膜型电致发光显示装置的方法和薄膜型电致发光显示装置,以通过在包括离子束源的一个真空浴中进行所有工艺来提高电致发光显示装置的可靠性。 。组成:圆柱电极作为ITO(氧化铟锡)透明电极(12)形成在玻璃或陶瓷基板(11)上。通过在ITO透明电极(12)上沉积SiO 2(13a)和Ta 2 O 5(13b)的氧化物,在ITO透明电极(12)上形成下部绝缘层。在下部绝缘层上形成发光层(14)。通过注入氧气和氩气的混合气体来执行等离子体工艺。在发光层(14)上形成包括Ta 2 O 5(15b)和SiO 2(15a)的上部绝缘层。在上绝缘层上形成金属电极(16)。
展开▼