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Pattern for focus evaluation and focus evaluation method
Pattern for focus evaluation and focus evaluation method
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机译:焦点评估的模式和焦点评估方法
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摘要
Transfer the pattern onto the wafer at various wafer locations using a reticle with a micropattern whose microcircumference is below the resolution limit of the stepper or a distance apart from the resolution limit, and measure the pattern dimensions. As a result, the best focus position (the wafer position in focus) can be easily determined.
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