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Material used for nano-imprint lithography for producing embossed nano-structure in thin film on substrate, useful in optics, optoelectronics and microelectronics, is embossed above glass transition temperature
Material used for nano-imprint lithography for producing embossed nano-structure in thin film on substrate, useful in optics, optoelectronics and microelectronics, is embossed above glass transition temperature
Materials used for nano-imprint lithography for producing embossed nano-structures in thin films on substrates consist of polymers with high plasma etching resistance and thermal stability, which are embossed at 60-180, preferably 80-100 deg C above the glass transition temperature of the polymer.
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