Device for chemically passivating edge defects in silicon solar cells comprises applying a suitable etching solution containing alkaline components, and allowing the reaction to slowly take its course on the edge of the cell

摘要

Device for chemically passivating edge defects in silicon solar cells comprises: (i) applying a suitable etching solution containing alkaline components such as KOH to the edge of the cell so that the chemical reaction is limited to a narrow edge region; and (ii) allowing the reaction to slowly take its course on the edge of the cell after applying the etching solution and strongly accelerating using suitable methods. Preferred Features: The etching solution contains e.g. KOH, NaOH, NH4OH, organic lyes e.g. TMAH, cholin, alkaline persulfate solutions e.g. KOH + (NH4)2S2O8, NaOH + (NH4)2S2O8, acids such as HNO3 + HF, HNO3 + HF + CH3COOH, HNO3 + HF + CH3COOH, HNO3 + HF + CH3COOH + HClO4, hydrazine solutions or other known silicon etching solutions.