Method for producing solar cells, involves applying boron glass on part of surface of silicon wafer, and applying boron glass as etching barrier during etching of silicon wafer in texture etching solution

摘要

The method involves applying boron glass (104) on a part of the surface of a silicon wafer (102), and applying the boron glass as etching barrier during etching (16) of the silicon wafer in a texture etching solution. An alkaline texture etching solution is applied, particularly has potassium hydroxide and isopropyl alcohol. A dielectric layer, has silicon nitride, titanium dioxide or silicon dioxide, is applied on two side (108,110) of silicon wafer by a chemical low pressure gaseous phase separation.