Shadow mask for local processing of substrate has micromechanical structure opening facilitating local processing

摘要

The shadow mask (6) lies in intimate contact with the surface of a substrate and has at least one micromechanical-structured opening (116,118), e.g. provided via electrochemical etching, for allowing local processing of the substrate. An Independent claim for a method for manufacture of micromechanical openings in a shadow mask is also included.