fotoempfindliches resin based on polyvinyl alcohol fotoempfindliche composition, and method for production of pattern using the composition

摘要

PROBLEM TO BE SOLVED: To ensure satisfactory water and heat resistances, sufficiently high water solubility and satisfactory miscibility with an anionic additive by specifying the content of a PVA type high molecular compd. contg. specified constituent units. ;SOLUTION: This PVA type photosensitive resin is made of a PVA type high molecular compd. contg. 0.5-10mol% constituent units represented by formula I and 0.1-20mol% constituent units represented by formula II. The molar ratio of the units represented by the formula I to the units represented by the formula II is preferably 2. In the formula, R¹ is a residue of a quaternized arom. N-contg. heterocyclic ring, R² is H or lower alkoxy, (m) is 0 or 1, (n) is an integer of 1-6 and each of X¹ and X² is H, Na, K or ammonium.;COPYRIGHT: (C)1997,JPO