The lithography graph printing edition which possesses the high chemical resistance

摘要

(57) Abstract Useful picture formation possible element is disclosed as a lithography graph printing component. Element, includes the backing material, foundation layer, and top layer. Foundation layer wets and the tolerance for the water attack washing, includes the combination of two polymer substances which offer the both of the tolerance for example for ULTRAVIOLET RADIATION washing. As for foundation layer, or photochemically it is possible in thermal imagery formation possible element, to use in picture formation possible element. To be desirable the 1st polymer substance, the N- substitution maleimide, it is the copolymer of methacrylic amide, and methacrylic acid, the 2nd polymer substance (1) the copolymer which includes the pendant urea basis, (2) the copolymer which includes the pendant sulfonamide basis, or (3) is either of those combinations. Also the chemical composition which includes the polymer of the aforementioned two is done claim.