The method of forming the SiO2-based ceramic coating

摘要

PURPOSE: To form a close ceramic film in which a characteristic is excellent and a crack is eliminated at a low temperature in a short time by forming a film of polysilazane having Si-H bond in the molecule on a substrate and thereafter bringing a mixed solution containing an alkoxysilane and water into contact with the film. ;CONSTITUTION: A film of a polysilazane of a general formula I (but R¹ to R³ independently denote a hydrogen atom and an alkyl group respectively and at least one of R¹ to R³ denotes a hydrogen atom) having Si-H bond and/or N-H bond is formed on a substrate. A mixed solution containing an alkoxysilane and water is brought into contact with the film. In such a way, the close ceramic film is formed at a low temperature, especially even at normal temperature and applied to plastics and electronic parts.;COPYRIGHT: (C)1996,JPO