首页> 外国专利> Thickness or displacement measuring apparatus using a capacitance meter, and thickness or displacement measuring method using a capacitance meter

Thickness or displacement measuring apparatus using a capacitance meter, and thickness or displacement measuring method using a capacitance meter

机译:使用静电容量计的厚度或位移测量装置以及使用静电容量计的厚度或位移测量方法

摘要

PURPOSE: To measure the thickness and displacement of an insulating film with one electrostatic capacitance meter simply by adding a simple device. ;CONSTITUTION: A thickness or displacement measuring apparatus is made up of a flat type main electrode 1, a first flat plate-shaped guard electrode 2 for housing the main electrode 1 being insulated, a second flat tabular guard electrode 2' to house the first flat tabular guard electrode 2 being insulated, and a tabular earth electrode 8 placed on the top of the second flat tabular guard electrode 2 through an insulation member. In a method of measuring the thickness, the second flat tabular guard electrode 2' and the tabular earth electrode 8 are measured under the condition of insulation. In a method of measuring the displacement, the second flat tabular guard electrode 2 and the tabular earth electrode 8 are measured under the condition of a shortcircuiting.;COPYRIGHT: (C)1996,JPO
机译:目的:通过添加一个简单的设备,用一个静电电容计测量绝缘膜的厚度和位移。组成:厚度或位移测量装置由扁平型主电极1,用于容纳主电极1的第一平板状保护电极2绝缘,用于容纳第一主电极1的第二扁平板状保护电极2'组成扁平平板状保护电极2被绝缘,并且平板状接地电极8通过绝缘构件被放置在第二扁平平板状保护电极2的顶部。在测定厚度的方法中,在绝缘条件下测定第二扁平平板状保护电极2'和平板状接地电极8。在测量位移的方法中,在短路条件下测量第二扁平平板状保护电极2和平板状接地电极8 。;版权:(C)1996,JPO

著录项

  • 公开/公告号JP3442871B2

    专利类型

  • 公开/公告日2003-09-02

    原文格式PDF

  • 申请/专利权人 インタクト株式会社;

    申请/专利号JP19940187873

  • 发明设计人 則内 健司;

    申请日1994-07-19

  • 分类号G01B7/06;G01B7/00;

  • 国家 JP

  • 入库时间 2022-08-22 00:21:51

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