Resist surface anti-reflective coating forming composition and pattern forming method

摘要

PURPOSE: To form a pattern high in dimensional accuracy by using a composition consisting of an aq. solution of a water soluble fluorine compound as a resist surface antireflection film formable composition, forming and removing an antireflection film by simple method. ;CONSTITUTION: The resist surface antireflection film formable composition consists of the aq. solution of water soluble fluorine compound. The water soluble fluorine compound is, for instance, perfluoroalkyl carboxylic acid and its salt. The composition consisting of the water soluble fluorine compound is applied to a resist film obtained by applying a photoresist composition to a substrate. After that, a prescribed pattern is exposed on the photoresist and the obtained resist surface antireflection film and is developed to form the pattern. As a result, the antireflection film is easily formed since the resist surface antireflection film formable composition is applied to the photoresist as an aq. solution. And the antireflection film is easily removed by washing or developing with an alkali solution.;COPYRIGHT: (C)1994,JPO&Japio