Membrane method and the device by the chemical vapor phase growth method of the metallic oxide to the baseplate surface

摘要

(57) Abstract Making the boundary layer decrease which is formed to the occasion where the membrane is formed on the baseplate surface with chemical vapor phase growth method, it regards the membrane method of improving the uniformity of the gas boundary layer which is formed in the reaction interior. Thickness and uniformity of boundary layer improve the 1st sound wave and or due to the fact that the 2nd sound wave, or other disturbance source is introduced inside the chamber. Furthermore, it is possible to vibrate the chuck.