首页> 外国专利> ATMOSPHERIC PRESSURE PLASMA TREATMENT DEVICE, FILM MANUFACTURED BY USING THE SAME, MANUFACTURING METHOD OF FILM AND FILM MANUFACTURED BY THE SAME

ATMOSPHERIC PRESSURE PLASMA TREATMENT DEVICE, FILM MANUFACTURED BY USING THE SAME, MANUFACTURING METHOD OF FILM AND FILM MANUFACTURED BY THE SAME

机译:使用相同的薄膜制造的常压等离子体处理装置,使用该薄膜的薄膜的制造方法以及薄膜的制造方法

摘要

PROBLEM TO BE SOLVED: To provide an atmospheric pressure plasma treatment device capable of preventing an electrode from pollution and stably manufacturing a film, and to provide the film having stable quality and a manufacturing method of the same.;SOLUTION: For the atmospheric pressure plasma treatment device, forming the film on a surface of a base material by locating the base material between electrodes facing each other under an atmospheric pressure of under the pressure nearly the same as the atmospheric pressure, and by generating a discharge plasma by impressing a high frequency voltage between the electrodes under the atmosphere including reaction gas and inert gas. An exchangeable covering material is arranged at least on a part of the surface of the electrode.;COPYRIGHT: (C)2003,JPO
机译:解决的问题:提供一种能够防止电极污染并且稳定地制造膜的大气压等离子体处理装置,并且提供具有稳定质量的膜及其制造方法。处理装置,通过将基材放置在在与大气压力几乎相同的压力下的大气压下彼此面对的电极之间,并通过施加高频率而产生放电等离子体,从而在基材表面上形成膜。大气中电极之间的电压,包括反应气体和惰性气体。可交换的覆盖材料至少布置在电极表面的一部分上。版权所有:(C)2003,JPO

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