TRANSPARENT CONDUCTIVE FILM FORMING MATERIAL AND MANUFACTURING METHOD, TRANSPARENT CONDUCTIVE FILM, TOUCH PANEL AND MANUFACTURING METHOD, PLASMA DISPLAY AND MANUFACTURING METHOD, SOLAR CELL AND MANUFACTURING METHOD, CONDUCTIVE FILM AND MANUFACTURING METHOD, HEAT RAY REFLECTING GLASS AND MANUFACTURING METHOD, LIQUID CRYSTAL DISPLAY DEVICE AND MANUFACTURING METHOD, INORGANIC ELECTROLUMINESCENSE ELEMENT AND MANUFACTURING METHOD AND ORGANIC ELECTROLUMINESCENSE ELEMENT AND MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a transparent conductive film able to attain high efficiency and low cost for production, material forming the same and manufacturing method.;SOLUTION: This transparent conductive film is composed of a material that contains a main component of indium oxide, germanium oxide of 0.1% by weight or more and 5.0% by weight or less, and silicon oxide of 0.1% by weight or more and 5.0% by weight or less, wherein a sputtering target is formed from the material and a thin film is formed through a sputtering method using the sputtering target.;COPYRIGHT: (C)2002,JPO