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The system and method in order to offer the lithography illuminant for semiconductor manufacturing process
The system and method in order to offer the lithography illuminant for semiconductor manufacturing process
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机译:为半导体制造过程提供光刻光源的系统和方法
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摘要
(57) Abstract Method in order includes the fact that the process fluid plume is generated, to offer the lithography illuminant is offered. The cover fluid of the same axis occurs around the process fluid plume. It forms the plasma, by offering the energy source which is collided to the process fluid plume.
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