PYRENESULFONIC ACID ONIUM SALT COMPOUND, METHOD FOR PRODUCING THE SAME COMPOUND, PHOTOSENSITIVE RESIN COMPOSITION USING THE SAME COMPOUND AND PHOTOSENSITIVE MATERIAL USING THE SAME

摘要

PROBLEM TO BE SOLVED: To solve problems that a highly sensitive photoacid generator compound is demanded in a photosensitive resin composition exhibiting a spectral sensitivity to light at 365 nm and to provide a pyrenesulfonic acid onium salt compound.;SOLUTION: The pyrenesulfonic acid onium salt compound having a plurality of sulfonic acid onium salt moieties is used as the photoacid generator in a photosensitive material basically comprising a polymer increasing the solubility in an aqueous solution of an alkali by actions of an acid and the photoacid generator. Thereby, the photosensitive material exhibiting a positive type behavior with a good sensitivity can be provided.;COPYRIGHT: (C)2003,JPO