Is drawn by the drawing manner and its manner of the pattern edition which possesses alignment pattern the pattern edition

摘要

PROBLEM TO BE SOLVED: To provide a pattern forming method capable of forming alignment patterns and a regular pattern with good accuracy of positional relation in a patterned plate with alignment patterns. SOLUTION: When patterns are formed for a patterned plate with a regular pattern B such as a reticle pattern or a shadow mask pattern and alignment patterns A1, A2, A3, the alignment patterns A1, A2, A3 are formed before forming the regular pattern B and the alignment patterns A1, A2, A3 of the same shape are formed again in a superposed state after forming the regular pattern B. Relative displacement between the alignment pattern and the regular pattern varying dependently on the time of a pattern forming system while forming the regular pattern is almost completely corrected, and the lowering of the positional accuracy of pattern varying dependently on pattern size can be suppressed.