MASK, SUBSTRATE WITH LIGHT REFLECTION FILM, METHOD FOR FORMING LIGHT REFLECTION FILM, METHOD FOR MANUFACTURING ELECTRO-OPTIC DEVICE, ELECTRO-OPTIC DEVICE, AND ELECTRONIC APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a mask for manufacturing a substrate with a light reflection film which lessens the occurrence of interference fringes, with which the substrate with the light reflection film is manufactured, a method for manufacturing the light reflection film, an electro-optic device provided with the substrate with the light reflection film which lessens the occurrence of the interference fringes, and an electronic apparatus provided with the substrate with the light reflection film which lessens the occurrence of the interference fringes.;SOLUTION: The substrate with the light reflection film which is made substantially equal in the heights of a plurality of the projecting parts and the depths of the recessed parts formed on a base material, is formed with the plane shapes of a plurality of the projecting parts or the recessed parts to circles overlapping one ach other and polygonal shapes overlapping on each other or plane shapes of either one thereof and is randomly arrayed with a plurality of the projecting parts or the recessed parts in a plane direction is formed by using the mask which is formed with light transparent parts or light opaque parts with the dot components for the number smaller than the number of dot regions as one unit to be arrayed irregularly in the unit and includes a plurality of such units.;COPYRIGHT: (C)2004,JPO