首页> 外国专利> METHOD FOR MANUFACTURING ELECTROMAGNETIC WAVE SHIELDING MATERIAL, MAGNETIC WAVE SHIELDING MATERIAL OBTAINED BY THE SAME, ELECTROMAGNETIC WAVE SHIELDING FORMATION USING THE SAME AND ELECTROMAGNETIC WAVE SHIELDING DISPLAY

METHOD FOR MANUFACTURING ELECTROMAGNETIC WAVE SHIELDING MATERIAL, MAGNETIC WAVE SHIELDING MATERIAL OBTAINED BY THE SAME, ELECTROMAGNETIC WAVE SHIELDING FORMATION USING THE SAME AND ELECTROMAGNETIC WAVE SHIELDING DISPLAY

机译:制造电磁波屏蔽材料的方法,使用相同的电磁波屏蔽形成体获得的电磁波屏蔽材料使用相同的电磁波屏蔽显示

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing an electromagnetic wave shielding material superior in electromagnetic wave shielding property, transparency and non- visibility, with good productivity and to provide an electromagnetic wave shielding material manufactured by the method, an electromagnetic wave shielding formation which is used for the electromagnetic wave shielding material and which is superior in electromagnetic wave shielding property, transparency and non-visibility and an electromagnetic wave shielding display. SOLUTION: The manufacturing method of the electromagnetic wave shielding material includes a process (1) for setting a metallic layer having corrosion resistance with respect to the etching liquid of copper and working a first copper layer into a geometric graphic in metallic foil having copper layers on both faces of the core, a process (2) for coating the whole geometric graphic or a part of it with a resin layer on both sides where the geometric graphics are formed and a process (3) for removing a second copper layer opposite to the face where the geometric graphic is formed and removing the core.
机译:解决的问题:提供一种电磁波屏蔽性,透明性和不可见性优良,生产率高的电磁波屏蔽材料的制造方法,以及通过该方法制造的电磁波屏蔽材料用作电磁波屏蔽材料,具有优异的电磁波屏蔽性能,透明性和非可见性以及电磁波屏蔽显示器。解决方案:电磁波屏蔽材料的制造方法包括以下步骤(1):设置相对于铜的蚀刻液具有耐腐蚀性的金属层,然后在其上具有铜层的金属箔中将第一铜层加工成几何图形。芯的两个面,用于在整个几何图形或其一部分上涂覆形成有几何图形的两侧的树脂层的方法(2),以及用于去除与金属图形相对的第二铜层的方法(3)。形成几何图形并去除核心的位置。

著录项

  • 公开/公告号JP2003046293A

    专利类型

  • 公开/公告日2003-02-14

    原文格式PDF

  • 申请/专利权人 HITACHI CHEM CO LTD;

    申请/专利号JP20010235076

  • 申请日2001-08-02

  • 分类号H05K9/00;B32B7/02;B32B15/08;B32B15/20;G09F9/00;

  • 国家 JP

  • 入库时间 2022-08-22 00:17:15

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