MEASURING METHOD, ADJUSTING METHOD FOR PROJECTION OPTICAL SYSTEM, ADJUSTING METHOD FOR ALIGNER, ALIGNER AND METHOD OF MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a measuring method in which a pattern of a measuring object is captured quickly within a visual field range of a length measuring SEM and in which a size of the pattern on a substrate is measured in a short time.;SOLUTION: Patterns 30 for dense line evaluation are formed in such a way that patterns 31 as length measuring objects are surely included in them, even when detection visual fields 21 are set in any positions in a range 32 decided on the basis of a stage positioning accuracy 22 and the detection visual fields 21 of the length measuring SEM 10 on the substrate. When the substrate is mounted on a stage of the length measuring SEM 10 so as to be positioned, the detection visual fields 21 capture any of the patterns 30 for dense line evaluation even when they are deviated within the stage positioning accuracy. Consequently, it is not required to move the stage newly or to search the patterns, the patterns of the length measuring objects are selected from the captured patterns, a length in a desired place is measured, and the time for a pattern search requiring a half or more of the processing time is reduced.;COPYRIGHT: (C)2004,JPO