首页> 外国专利> DIALKENYLDIEPOXYBISPHENOL-POLYSILOXANE ALTERNATE COPOLYMER OR DERIVATIVE OF THE SAME AND EPOXY RESIN COMPOSITION FOR ELECTRONIC MATERIAL OBTAINED BY BLENDING THE SAME

DIALKENYLDIEPOXYBISPHENOL-POLYSILOXANE ALTERNATE COPOLYMER OR DERIVATIVE OF THE SAME AND EPOXY RESIN COMPOSITION FOR ELECTRONIC MATERIAL OBTAINED BY BLENDING THE SAME

机译:乙二醛-二氧联苯二酚-聚氧乙烯醚的交替共聚物或衍生物,以及通过共混获得的电子材料的环氧树脂组合物

摘要

PROBLEM TO BE SOLVED: To obtain a dialkenyldiepoxybisphenol-polysiloxane alternate copoly mer which is a novel compound and a derivative of the same, provide a method for producing the same and obtain an epoxy resin composition for electronic materials, especially for sealing semiconductors, improved in lowering stress resistance to heat history without spoiling mechanical strengths, close adhesive ness, adhesivity and heat resistance by blending the novel compound. ;SOLUTION: This dialkenyldiepoxybisphenol-polysiloxane alternate copolymer and the derivative of the same are obtained by a manufacturing method in which a dialkenyldiepoxybisphenol (A) is brought to react with a polysiloxane (B). This epoxy resin composition for electronic materials, especially for sealing semiconductors, is obtained by blending the alternate copolymer.;COPYRIGHT: (C)2003,JPO
机译:解决的问题:为了获得作为新颖化合物及其衍生物的二烯基二环氧双酚-聚硅氧烷交替共聚体,提供其制备方法并获得用于电子材料,特别是用于密封半导体的环氧树脂组合物,其改进如下:通过掺入新型化合物,可降低对热历史的抗应力性能,而不会破坏机械强度,紧密粘合性,粘合性和耐热性。 ;解决方案:该二烯基二环氧双酚-聚硅氧烷交替共聚物及其衍生物是通过使二烯基二环氧双酚(A)与聚硅氧烷(B)反应的制造方法获得的。这种电子材料用环氧树脂组合物,特别是用于密封半导体的环氧树脂,是通过将交替共聚物共混而制得的。; COPYRIGHT:(C)2003,JPO

著录项

  • 公开/公告号JP2003048989A

    专利类型

  • 公开/公告日2003-02-21

    原文格式PDF

  • 申请/专利权人 NIPPON UNICAR CO LTD;

    申请/专利号JP20010241655

  • 发明设计人 SHOJI HIROAKI;MORIKAWA IKUTARO;

    申请日2001-08-09

  • 分类号C08G81/00;C08G59/14;C08G77/52;H01L23/29;H01L23/31;

  • 国家 JP

  • 入库时间 2022-08-22 00:16:39

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